R&D is a pivotal activity for universities, institutes, national laboratories, and industry as they focus on gaining a deeper understanding of the world around us and search for solutions to global challenges. Their work is not limited to the traditional application of plasma etching and deposition, semiconductors device fabrication. These systems are now commonly used in research endeavors beyond semiconductor device fabrication that enrich our understanding of fundamental physics, chemistry, materials, and biology as well as  highly purposeful development of more efficient and technologically advanced products. Results of such endeavors include advances in materials, electronics, communications, data storage, and medicine to name just a few.

Although R&D is not easily characterized as a market, one trend seems apparent: there is a drive for better understanding of phenomenon as we transition from the macroscopic to the microscopic and beyond. Hence, the field of nanotechnology has recently emerged to study and use materials on an atomic or molecular scale. To put it in perspective, nanotechnology generally refers to a scale where the dimensions are less than 100 nanometers or 1 thousandth the width of a hair!

Advanced Vacuum provides plasma etch and thin film deposition systems to the R&D market for a wide range of applications ranging from nanoscale technology to solar cell studies and has made complex plasma processing technology accessible to R&D organizations throughout the world. Because of the impressive performance and quality of Advanced Vacuum plasma processing systems, the systems are found at institutes ranging from national laboratories to leading universities as well as companies defining science and technology boundaries. 

Typical Applications: MEMS, Nanotechnology, Photonics, Solid State Lighting, Renewable Energy, Power Devices

  • Etch
    • Si
    • SiNx
    • SiC
    • SiO2
    • Quartz
    • Polymers (e.g. photoresist, BCB, polyimide)
    • Metals (fluorine based or sputter etch)
    • Metal dielectrics
  • Deposition
    • SiO2
    • SiON
    • SiNx
    • SiC
    • a-Si:H




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